제품소개
CHEMICALS(RBP)
CHEMICALS(LP)
INKS
ENGINEERING

Micro Etchant for Imaging

Micro Etchant for Imaging[DFR & PSR]

Etchbrite 519[H2SO4+H2O2]
Application
[적용공정]
DFRfor Inner & Outer layers
Working sol.
사용액
H2SO4 6% + H2O2 4% + EB529 10%[2% w/new]
Temp. 40℃ [30~40℃]
Dwell time. 40sec[30~60sec]
Chloride
[염화물]
 
No chloride
Type
[종류]

EB 529C Concentrate

Etchbrite 535[HCL]
Application
[적용공정]
Solder Mask & DFR
Working sol.
사용액
100% make up
Base
기초용액
HCL Base
Type
[종류]
EB 535M for make up
EB 535R for replenish
New version
[신제품]
ComEtch V9 will come January 2011. Running at 1st customer for mass production[2011년 1월 출시예정]

Micro Etchant CornEtch V9

Topography
(after Micro Etching)
Cross Cut for SM
(after 30min. Dipping at 10% HCL solution)

Micro Etchant EB 519

Base Material Copper
(after micro etching)
Uniplated Copper
(after micro etching)